Publications
Grayscale e-beam lithography: Effects of a delayed development for well-controlled 3D patterning
Mortelmans, T., Kazasiz, D., Guzenko, V.A., Padeste, C., Braun, T., Stahlberg, H., Li, X., Ekinci, Y.
Microelectronic Engineering 225, 111272 (2020)
DOI: DOI
1
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